CE Certification China Suppliers Factory Electronic Ultra-Pure Water System for Semiconductor & Microelectronics with 18.2 MΩ·cm Resistivity Factories, Manufacturer
This electronic ultra-pure water system is a top choice for microelectronics, semiconductor, IC, and precision display manufacturing. Designed to deliver water with an impressive resistivity of 18.2 MΩ·cm and a TOC level of less than 2 ppb, this system utilizes a comprehensive multi-stage process. Key stages include pretreatment, reverse osmosis (RO), electrodeionization (EDI), polishing mixed bed, UV oxidation (185/254 nm), vacuum degassing, and ultrafiltration. It adheres to industry standards such as GB/T 11446.1 EW-I and ASTM D5127-13, making it ideal for lithography, etching, cleaning, and high-purity reagent preparation. As a leading manufacturer and supplier in China, our factory guarantees high-quality products tailored to meet the stringent demands of your applications
Shanghai Tongjie Environmental Protection provides semiconductor-grade ultrapure water systems employing a comprehensive process flow: pretreatment + two-stage RO + EDI + polishing mixed bed + terminal ultrafiltration + degassing membrane. The produced water exhibits stable resistivity ≥18.2 MΩ·cm (at 25°C), TOC ≤1 ppb, particulate matter ≤0.05 μm, and dissolved oxygen ≤5 μg/L, fully complying with SEMI F57, ASTM E1-2018, and the first-level ultrapure water standard for the electronics industry. Equipped with 316L EP/PVDF high-purity piping, nitrogen-sealed storage tanks, and AIoT intelligent monitoring systems, these systems serve applications in 8–12-inch wafers, advanced packaging, display panels, photovoltaics, and precision electronics manufacturing.
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Core Advantages
Excessively High Purity
18.2 MΩ·cm stable output from a dual-stage RO+EDI polishing mixed bed, with TOC ≤2 ppb, metal ions <1 ppt, and particles <0.05 μm.
Zero-Pollution Materials
316L EP stainless steel (Ra ≤ 0.25 μm), PVDF piping, and nitrogen-sealed double-insurance storage tanks for guaranteed high purity.
Intelligent Monitoring
Real-time tracking of 40+ parameters including resistivity, TOC, DO, and metal ions 24/7 with automatic backup switching.
High Recovery Rate
Achieves recovery rate ≥85%, with concentrated water reused, resulting in a 30% reduction in energy consumption per ton.
Modular skid-mounted design enables rapid factory prefabrication and commissioning, with production operational within 15 days on-site, fully compatible with cleanroom layouts.
An ideal solution for meeting short-term or long-term decentralized water supply demands
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Application Scenarios
Semiconductor wafers: Cleaning, lithography, etching, and deposition of 8–12-inch wafers.
Advanced packaging: Bumping, TSV, WLCSP cleaning.
Display panel: LCD/OLED cleaning, developing, and etching.
Precision Electronics: Optical Components, Sensors, and Medical Device Cleaning.
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Send Inquiry
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FAQ
Can the water quality meet the requirements for a 12-inch advanced process?
Fully compliant. Total organic carbon (TOC) ≤2 ppb, particulate matter ≤0.1 μm, and metal ions <1 ppt, suitable for advanced processes up to 7 nm.
Does the system support 24/7 uninterrupted operation?
Standard configuration features one active unit and one standby unit with automatic switching, ensuring automatic failover to the backup unit and zero downtime risk.
Can we provide specialized designs for cleanrooms?
We offer cleanroom-grade modular units, high-purity piping systems, nitrogen sealing solutions, and customized cleanroom installation packages.
What is the typical deployment time for the system?
Our modular skid-mounted design allows for rapid factory prefabrication. Once on-site, the system can be operational within 15 days.
What materials are used to prevent secondary contamination?
We use 316L EP stainless steel with Ra ≤ 0.25 μm and PVDF high-purity piping to ensure zero pollution throughout the water distribution process.
How does the system contribute to energy saving?
The system achieves a recovery rate of ≥85% by reusing concentrated water, which typically reduces energy consumption by 30% per ton of water produced.
