ODM How Is Ultra Pure Water Produced Factory & Manufacturer

Pure H₂O undergoes slight self-ionization into H⁺ and OH^- ions. At 25°C, the intrinsic electrical resistivity of completely deionized water reaches the thermodynamic limit of 18.24 MΩ·cm (conductivity ≤ 0.055 μS/cm).

• Target Resistivity (25°C): 18.18 – 18.20 MΩ·cm
• Dissolved Sodium (Na⁺): < 0.001 ppb (1 ppt)
• Chloride (Cl^-): < 0.001 ppb (1 ppt)

Total Oxidizable Carbon (TOC) represents trace non-ionic organic molecules that escape standard ion exchangers. In wafer lithography and thin-film deposition, residual hydrocarbons produce microscopic surface contamination.

• Bulk TOC Target: < 1.0 ppb (μg/L)
• Critical Fab Rinsing: < 0.5 ppb (500 ppt)
• Oxidation Method: 185 nm VUV Photolysis

At 3nm and 2nm semiconductor nodes, colloidal silica and inert particulate matter larger than 10 nanometers bridge gate contacts, causing structural defects and devastating batch yield drops.

• Particle Limit (≥ 20 nm): < 1 count / mL
• Reactive Dissolved Silica: < 0.2 ppb
• Colloidal Silica: Undetectable

In sub-7nm extreme ultraviolet (EUV) lithography, chemical mechanical planarization (CMP), and anisotropic silicon etching, UPW is the universal rinsing medium. Our OEM/ODM UPW skids integrate real-time boron, silica, and TOC laser spectrometers, guaranteeing that no atomic redeposition takes place on silicon substrates.

• SEMI Standard: SEMI C35 / C79 Type E-1.3
• Hydraulic Loop: PVDF-HP BCF Welded Piping
• Boron Rejection: > 99.8% with selective resin

Biotechnology and parenteral medicine lines require sterile Purified Water (PW) and Water for Injection (WFI). Membrane-based chemical-free trains eliminate thermal still costs while fully complying with cGMP, USP ⟨645⟩, USP ⟨643⟩, and European Pharmacopoeia (EP) criteria.

• Bacterial Endotoxin: < 0.25 EU / mL
• Total Viable Count: < 10 CFU / 100 mL
• Sanitization: 85°C Hot Water Sanitation (HWS)

Next-generation N-type TOPCon, HJT solar cell manufacturing, and Proton Exchange Membrane (PEM) water electrolyzers require massive volumes of ultrapure demineralized water. Residual conductive ions in electrolyzers foul catalyst surfaces and accelerate membrane degradation.

• Stack Water Conductivity: < 0.1 μS/cm
• Chloride Protection: Zero pitting in Titanium anodes
• Water Recovery Ratio: Up to 90% via High-Ratio RO

Integration of hydrodynamic predictive algorithms monitoring transmembrane pressure (TMP), normalized permeate flux, and salt passage curves in real-time. The system predicts biofouling and scaling 15 to 20 days prior to flux deterioration, auto-optimizing Clean-In-Place (CIP) schedules.

Eliminating non-regenerable resin disposal through Ultra-High Purity Continuous Electrodeionization (UHP-EDI). Utilizing patented multi-chamber bipolar membrane configurations, secondary-stage polishing operates continuously without spent radioactive-rated resin disposal hazards.

Traditional UPW facilities lose 20-30% of incoming water to RO concentrate and EDI reject streams. Shanghai Tongjie pairs Disc Tube Reverse Osmosis (DTRO) and high-pressure STRO membranes to recover 90% to 95% of effluent, redirecting recovered brine into industrial utilities and cooling towers.